Evaluating resists using EUV open-frame exposure, an ARM resist developing analyzer, and a swelling analyzer based on the QCM method. We also evaluated resolution using a simulator. Also measuring gas emitted from the resist being exposed. All supplied by LTJ to facilitate your EUV lithography R&D.

Figure 1: Resist evaluation methods (real and virtual)

Figure 2: EUVES-9000 exterior view

Figure 3: Exterior view of the ARM-800 Advanced Rate Monitor

Figure 4: RDA-Qz3 exterior view

Figure 5: Result of simulation for a pattern size of 22-11nm