The 8th Micro Photoresist Information Exchange Conference (Oct-9 to 12-2018)

Company News

Re: The 8th Micro Photoresist Information Exchange Conference (Oct-9 to 12-2018 , hold at Shanghai Jiao Tong University) & Shanghai ICRD visit RNC TECHNOLOGY , Litho Tech Japn Co. Ltd( LTJ) & GenISys are pleased to introduce the related photoresist products & software.

(1). Mr. Taksatorn (GenISys specialist) introduce BEAMER, TRACER, LAB & ProSEM software.

(2). Mr. Minami (LTJ – PRESIDENT) share the exposure & development analyst report for BM photoresist.

(3). Mr. Raymond Lee (RNC TECHNOLOGY – Director) introduce Microresist Technology GmbH’s photoresist products & Nanoimprint resist products.

(4). Mr. Minami (LTJ) joined with Mr. Raymond Lee ( RNC Tech- Director ) & sales manager to visit Shanghai IC R&D Centre (ICRD) for LTJ photoresit analysis equipments & GenISys Gmbh related software.

Photos