IC China 2019 has been held from Sep-3 to 5-2019 at the Shanghai New International Expo Centre.

RNCT has joined this exhibition on booth no. N4-168. We are proud to exhibit:

Micro Resist Technology GmbH (MRT)’s high quality Positive & Negative Photoresist,E-Beam photoresist、Lift-off resist、Greyscale & Direct Write Laser(DWL) resist.

DisChem (USA) – innovative chemical solutions for opto-electronic manufacturing, SurPass – Microlithoography Adhesion Promoter/Priming Agent & DisCharge – E-Beam / SEM Anti-Charging Agent.

GenISys GmbH – LAB (Optical Lithography Simulation Software), after getting the data from RDA, then use LAB to simulate the photoresist image. The results are almost the same as the real experiment image. It is time & money save for using LAB. ProSEM (Metrology Software) – SEM Image Analysis & Metrology.