We took part in the CHInano Conference & Expo in Suzhou International Expo Center, China on October 28 -30, 2015.

The major products we introduced included the Nanoimprint technology of the MUR series from Chemiway (Maruzen Petrochemical Co. Ltd.), the UV Resist Resin with high etching resistance(抗蚀性) and rapid hardening nature (迅速硬化性) and the function of Litho Tech Japan (LTJ) Photolithography and Photoresist Development Analysis Instrument.

The Conference is the largest-scaled and most influential occasion for nanotechnology development and exchange in China. It is also the best platform for corporates’ brand building, product promotion, technology matchmaking and market expansion.

CHInano attracted more than 5000 professional visitors, 8 nanotech cluster associations, 25 professional institutions from different countries and regions in the world, as well as over 500 enterprise exhibitors. In addition, the conference received over 100 professional reports and shared the latest achievements and cutting-edge information in the fields of micro nano manufacturing, nanobiological medicine, nano environmental protection and cleaning technology and new nanomaterials.

Meanwhile, the Nanotech Forum invited world renowned experts from the nanotech industry, research communities and government departments to share the latest application results, forward-looking researches and the nanotech strategies adopted by the governments.