使用 LTJ 的 EUV 无图像开放式曝光器(EUVES-9000)、EUV 胶显影溶解分析仪、RDA-Qz3 分析 EUV 胶曝光膨胀现象、Outgassing 排气量度器，以及仿真软件模拟成型效果。LTJ 提供整套供研发 EUV 光刻技术的设备。

Figure 1: Resist evaluation methods (real and virtual)

Figure 2: EUVES-9000 exterior view

Figure 3: Exterior view of the ARM-800 Advanced Rate Monitor

Figure 4: RDA-Qz3 exterior view

Figure 5: Result of simulation for a pattern size of 22-11nm