模板，母模 & 模片 (STAMPS, MASTERS & SHIMS)
NILT 能成为卓越机器制造商而备受世界客户赞赏，其划时代的纳米级模具制造技术是最重要的支持。 客户可以不受限制地设计出属于自己的图形而又准确地体现在母模上，利用复制出来的子模，无论是试验或生产， 客户都可避免直接用母模可能产生的损伤导致的金钱损失，子模更能进一步造出镍模片帮您完成其他任务。NILT服务确实一应俱全。
硅质模板 (SILICON NIL STAMPS)
NILT客户可随意地设计出纳米图形，我们会用电子束E-BEAM LITHOGRAPHY, 紫外光蚀刻UV LITHOGRAPHY 或NIL 刻蚀出硅模板， 根据客户要求再造出聚合物子模或镍材模具。硅NIL模板可以以硅晶圆或切割成方块交给客人。 NILT是世界上最重要硅模板供应商之一，产品应用十分广泛，例如生物科技、蓝宝石图形化PSS等。
| 规格 |
| Stamp material | Silicon |
| Stamp sizes (wafer) | 2", 4", 6" |
| Stamp sizes (square) | Any square format cut from wafers |
| Stamp thickness | 500 µm (2"), 525 µm (4"), 650 µm (6") |
| Minimum lateral dimension | 20 nm |
| Aspect ratio | Up to 1:10 (pattern dependent) |
| Design | Customer specified |
| Design file format | gds, dxf, tdb |
| Anti-sticking | FDTS (optional) |
| Delivery time | Typically 4 weeks |
| Design file format | gds, dxf, tdb |
| Anti-sticking | FDTS (optional) |
| Delivery time | Typically 4 weeks |
石英 QUARTZ 模板 (FUSED SILICA NIL STAMPS)
NILT客户可随意地设计出纳米图形，我们会用电子束E-BEAM LITHOGRAPHY, 紫外光蚀刻UV LITHOGRAPHY 或NIL 刻蚀出硅模板，根据客户要求再造出聚合物子模或镍材模具。 硅NIL模板可以以硅晶圆或切割成方块交给客人。 FUSED SILICA模板因为透明度高所以用得最多应该是在UV 纳米压印UV NIL。
| 规格 |
| Stamp material | used silica (Quartz) |
| Stamp sizes (wafer) | 2", 4", 6" |
| Stamp sizes (square) | Any format cut from wafers |
| Stamp thickness | 1 mm (other upon request) |
| Minimum lateral dimension | 20 nm |
| Aspect ratio | Up to 1:5 (pattern dependent) |
| Design | Customer specified |
| Design file format | gds, dxf, tdb |
| Anti-sticking | FDTS (optional) |
| Delivery time | Typically 4 weeks |
镍模片 (NICKEL SHIM)
NILT可以从硅晶圆、聚合物或石英模板复制出镍片。 原创图形方法很多，除了电子束E-BEAM LITHOGRAPHY, 紫外光蚀刻UV LITHOGRAPHY 或NIL 刻蚀外，镭射干涉蚀刻法LASER INTERFERENCE LITHOGRAPHY 或 镭射画写LASER WRITING， 客户可以注明镍片是四方或长方形，最大尺寸甚至可达600mm X 60mm. 镍片在纳米压印技术上应用甚广，包括光电相关的如增光膜、抗反射膜， 在医学领域和实验室晶片LAB-ON-A-CHIP也趋普遍。
| 规格 |
| Stamp material | Nickel |
| Hardness | Different alloys are available |
| Stamp sizes | 2", 4", and square up to 600 mm x 600 mm |
| Stamp thickness | 100 um — 2 mm |
| Minimum lateral dimension | 100 nm |
| Aspect ratio | Up to 1:3 (pattern dependent) |
| Design | Customer specified |
| Design file format | gds, dxf, tdb |
| Anti-sticking | FDTS (optional) |
| Delivery time | Typically 4-6 weeks |
聚合物模板 (POLYMER NIL STAMPS)
NILT同样不会对图形设计作出任何限制。NILT客户可随意设计出纳米图形，母模制造通常会用电子束E-BEAM LITHOGRAPHY或紫外光蚀刻UV LITHOGRAPHY。 聚合物可以从石英或硅晶圆复制出来，一般交货时都以硅晶圆片托底。 聚合物模板的应用很广，包括折射膜、线路网格、传感器和疏水膜HYDROPHOBIC FILM。
| 规格 |
| Stamp material | COC, COP |
| Stamp sizes | Up to 6 inch round |
| Stamp thickness | 200 µm — 1 mm |
| Minimum lateral dimension | 100 nm |
| Aspect ratio | Up to 1:3 (pattern dependent) |
| Design | Customer specified |
| Design file format | gds, dxf, tdb |
| Anti-sticking | FDTS (optional, material dependent) |
| Delivery time | Typically 4 weeks |
PDMS 模板 (PDMS NIL STAMPS)
NILT 不会对图形设计作出任何限制。NILT客户可随意设计出纳米图形，母模制造通常会用电子束E-BEAM LITHOGRAPHY，NIL蚀刻或紫外光蚀刻UV LITHOGRAPHY。 PDMS可以从石英或硅晶圆复制出来，一般交货时都以硅晶圆片托底。 MICROFLUIDICS & LOC SHIMS 微流控器&实验室晶片 微流控器&实验室晶片的应用一般需要镍模片，NILT会以热压或注模INJECTION MOLDING方式制造镍模片给。
| 规格 |
| Stamp material | PDMS |
| Stamp sizes (wafer) | Up to 6 inch round |
| Stamp thickness | 1 mm (other upon request) |
| Minimum lateral dimension | 20 nm |
| Aspect ratio | Up to 1:3 (pattern dependent) |
| Design | Customer specified |
| Design file format | gds, dxf, tdb |
| Anti-sticking | FDTS (optional) |
| Delivery time | Typically 4 weeks |
标准模板 (STANDARD STAMPS)
NILT 的客户来自不同的领域，这种网络与经验容许我们在不同的领域里都能提供一系列标准规格的模板。
抗反射膜 (ANTI-REFLECTION)
在抗反射膜标准模板系列内，我们包含了可见光范围和近红外范围，以大面积为主，若客户想订制更大面积，我们乐意接受。
• 鹅眼结构
• 反射率可减低到 0.2%
| 规格 | Type B | Type A | Type C |
| Stamp ID | ARSS_B_06 | ARSS_A_02 | ARSS_C_02 |
| Material | Nickel | Nickel | Nickel |
| Grating type | Hexagonal Array | Hexagonal Array | Hexagonal Array |
| Pitch | 300 nm | 250 nm | 250 nm |
| Average height | 300 nm | 350 nm | 350 nm |
| Stamp thickness* | 300 µm | 300 µm | 300 µm |
| Stamp size* | 70 mm x 70 mm | 120 mm x 120 mm | 250 mm x 250 mm |
| Active area* | 50 mm x 50 mm | 100 mm x 100 | mm 200 mm x 200 mm |
| Expected %R PMMA | Less than 0.6% | Less than 0.2% | Less than 0.2% |
| Pattern polarity | Protrusions | Protrusion | Protrusions |
| 规格 | Type NIR |
| Stamp ID | ARSS_NIR_02 |
| Material | Nickel |
| Grating type | Hexagonal Array |
| Pitch | 500 nm |
| Average height | Larger than 700 nm |
| Stamp thickness* | 300 ?m |
| Stamp size* | 100 mm x 100 mm |
| Active area* | 80 mm x 80 mm |
| Expected %R acrylic polymer @ 900 nm | Less than 0.2% |
| Expected %R acrylic polymer @ 1500 nm | Less than 0.3% |
| Pattern polarity | Holes |
精工增光模 (LINEAR AND CIRCULAR ENGINEERED DIFFUSERS)
增光膜功能在于控制照明元素LIGHTING ELEMENTS和光源LIGHT SOURCES的光量，例如镭射、LED、LCD的背光源，而同时拥有很高的透光率。 NILT可帮客户订造精工增光模精准控制增光度，并可选择直线、椭圆形和圆形的效果。 我们这一增光模板系列是特意为研发阶段兼且有生产意向的客户订制，使用性非常强。
• 精工增光模板
• 直线或圆形
• 模板面积可达 120mm x 120mm
| 规格 |
| Circular version | Type B | Type D |
| Stamp ID | EDSS_B_C_V1 | EDSS_D_C_V1 |
| Structure type | Engineered Diffuser | Engineered Diffuser |
| Output type | Circular diffusion | Ciruclar diffusion |
| Diffusion angles (FWHM)* | 25o | 25o |
| Material | Nickel | Nickel |
| Stamp thickness | 300 µm | 300 µm |
| Stamp size | 70 mm x 70 mm | 120 mm x 120 mm |
| Active area | 50 mm x 50 mm | 100 mm - 100 mm |
| 规格 |
| ALinear version | Type B | Type D |
| AStamp ID | EDSS_B_L_V1 | EDSS_D_L_V1 |
| AStructure type | Engineered Diffuser | Engineered Diffuser |
| AOutput type | Linear diffusion | Linear diffusion |
| ADiffusion angles (FWHM)* | 1o / 80o | 1o / 80o |
| AMaterial | Nickel | Nickel
|
| AStamp thickness | 300 µm | 300 µm |
| AStamp size | 70 mm x 70 mm | 120 mm x 120 mm |
| AActive area | 50 mm x 50 mm | 100 mm x 100 mm |
衍射光栅 (DIFFRACTION GRATINGS)
NILT提供的衍射光栅是大型镍制模板，其纹路可呈线状或交叉状，双方的线距为500nm,平均深度为250nm。
• 80mm x 80mm有效面积（模板面积为100mm x 100mm）
• 纹路形状呈正弦曲線SINUSOIDAL
• 纹路不同的参数适合：
- LED & OLED 光的外耦合OUT-COUPLING
- 将不同光导入波导WAVEGUIDE
- 分开光束
- 镭射感应器
- 薄膜行业和太阳能光伏
| 规格 | Linear Grating | Crossed grating |
| Stamp ID | DG_L500 | DG_C500 |
| Material | Nickel | Nickel
|
| Profile shape | Sinusoidal | Sinusoidal |
| Pitch | 500 nm | 500 nm |
| Average depth | 250 nm | 250 nm |
| Stamp thickness* | 300 µm | 300 µm |
| Stamp size* | 100 mm x 100 mm | 100 mm x 100 mm |
| Active area* | 80 mm x 80 mm | 80 mm x 80 mm |
金属线栅偏光镜 (WIRE GRID POLARIZER)
纳米压印造出的金属线栅偏光镜一般需要测试，而最佳选择家使用NILT的金属线栅偏光镜标准模板。 我们的标准模板最大有效面积为12mm x 12mm, L/S 50nm, 线呈漕状，模板复制子模适用于UV或热压过程。
• 有利于纳米压印和金属线栅偏光镜的测试成本控制
• 漕宽、漕距均为50nm
| 规格 | Type A | Type B |
| Stamp ID | WGPSS_A_V1 | WGPSS_B_V1 |
| Stamp size | 2 inch round wafer with flat | 2 inch round wafer with flat |
| Stamp material | Silicon | Silicon |
| Active area | 12 mm x 12 mm | 6 mm x 6 mm |
| Stamp thickness | 500 µm +/- 25 µm | 500 µm +/- 25 µm |
| Structure size | 50 nm wide grooves with 50 nm spacing | 50 nm wide grooves with 50 nm spacing |
| Lateral tolerances | +/- 10 nm | +/- 10 nm |
| Structure depth | 100 nm | 100 nm |
| Vertical tolerances | +/- 15 nm | +/- 15 nm |
| Defect density | Less than 0.01% of patterned area | Less than 0.01% of patterned area |
微针体标准模板 (MICRO-NEEDLE STANDARD STAMP)
NILT提供的微针体标准模板是微针体的反面即微孔模板，经热压或铸均可造出所需微针形状。 又或先由标准模板复制一个聚合物子模，再经镀镍造出注塑用镍片，微针体可利用注塑过程而成。 标准模板造出的微针体有足够硬度可用于皮肤的不同测试，医学方面的涂药式微针或注射式微针也在应用行列。
• 微针呈方块排列相隔500um
• 有效面积达70mm(斜角计)
| 规格 | Micro-needle - Type A |
| Stamp ID | MNSS_A_V1 |
| Stamp material | Silicon |
| Microneedle layout | Square array |
| Microneedle base size | 100 µm x 100 µm |
| Microneedle height | 200 µm (base to tip) |
| Microneedle tip height | 70 µm |
| Microneedle tip radius of curvature | ~1 µm |
| Microneedle spacing | 500 µm |
| Stamp size | 100 mm diameter (SEMI standard wafer with a flat) |
| Stamp thickness | 525 µm (SEMI standard wafer with a flat) |
| Active area | 70 mm diagonal square area in the center |
大面积柱形标准模板 (LARGE AREA PILLARS)
大面积柱形标准模板是以方形排列光子晶体并分布在4个1cm2格子的硅晶圆上。
• 质量与成本效益都非常高
• 面积大兼可选4种不同规格的柱形
• 光子晶体结构
• 结构尺寸125nm – 275nm
| 规格 |
| Stamp ID | LAPSS_V1 |
| Stamp size | 2 inch round wafer |
| Stamp material | Silicon |
| Stamp thickness | 525 µm +/- 25 µm |
| Structure size | 125 nm, 175 nm, 225 nm, 275 nm (rounded squares) |
| Structure pitch | 200 nm, 300 nm, 400 nm, 500 nm |
| Protrusion height | 100 nm - 300 nm (you decide!) |
| Tolerance, lateral and vertical dimensions | +/- 15% |
| Defect density | Less than 0.1% of total patterned area |
微图形标准模板 (MICRO)
这种标准模板是为测试多种纳米压印, 有4种图形,包括直线、横线、柱状和孔状，其尺寸为1um, 5um, 10um, 50um呈现在20mm x 20mm硅晶圆片上。
| 规格 |
| Stamp ID | MSS_V1 |
| Stamp size | 20 mm x 20 mm |
| Stamp material | Silicon |
| Stamp thickness | 1 mm |
| Structure size | 1 µm - 50 µm |
| Etch depth | 2 µm, 5 µm or 10 µm |
| Pattern field size | 4 mm x 4 mm |
| Delivery time | 3-4 weeks |
亚微米标准模板 (SUB-MICRO)
NILT 的亚微米标准模板是专门为测试亚微米至纳米级压印的最适当工具；图形有3种，包括线(500nm)、柱(1um)、孔(2um)，材料可选择硅或石英，以20mm x 20mm为标准尺寸。
| 规格 |
| Stamp ID | SMSS_SIQZ_V1 |
| Stamp size | 20 mm x 20 mm |
| Stamp material | Silicon or Fused Silica |
| Stamp thickness | 1 mm |
| Structure size | 500 nm - 2 µm |
| Etch depth | 1 µm or 2 µm in Silicon. 500 nm in Fused Silica |
| Pattern field size | 5 mm x 5 mm |
| Delivery time | 3-4 weeks |
