全国半导体设备和材料标准化技术委员会
微光刻分技术委员会第三届年会
暨第12届微光刻技术交流会
Company News October 12, 2022 Read More第23届 中国国际光电博览会(CIOE)2021刚于2021年9月16-18日在深圳国际会展中心(广东省深圳市宝安区福海街道展城路1号)顺利完满举行
利满科技今次参展CIOE在 2A010 和2A011号展位,主要是介产品有:
1.)日本Litho Tech Japan (LTJ) 的光刻胶顕影分析仪器RDA(Photoresist Development Analysis Instrument)。RDA分析仪器不祇限用于研发及产,而且还对应光刻胶的质量管理、优化光刻胶使用工艺条件、对应客户投诉等,应用广泛及Eth Scanner #LT-Escan-1500 系统 和 3和1旋涂、烘烤、显影系统#Dual-1000。
2.)德国GenISys 公司LAB 光学光刻仿真软件,只要输入相关数据后可作光刻图型仿真,效果比美繁复的现实工艺,省人力物力/时间和金钱, SEM图像自动测量分析、报告生成 软件-ProSEM , 精准/测量结果的一致性、没有人为疏忽或避免主观判断的介入等影响和争议.
3.)美国DisChem 公司的光刻化学品 – SurPass光刻胶用增粘剂(Adhesion Promoter) 及DisCharge 电子束/SEM测量的除电荷积聚剂(Anti Charging Agent 导电胶).
4.)奥地利 Profactor 公司 (纳米压印模具脱模剂)#BGL-GZ-83 是一种快速、简易涂在模具上的脱模剂, 已广受客户应用在复制微/纳
米器件上。
最简易应用的纳米压印模具脱模剂#BGL-GZ-83 : 在复制模具/压印时, 关建步骤, 就是可否脱模成功。如要避免粘模, 就要尽量减少模具的表面张力、摩擦等等。
(Profactor公司也有纳米压印胶来配套应用的增粘剂#HMNP-12可供
选择。)
5.)德国Micro Resist Technology (MRT) 优质的正、负光刻胶,有电子束(E-Beam ) 光刻胶、剥离胶 (Lift off Resist) 、灰阶(Greyscale) 及激光直写(Direct Write Laser) 和 NIL纳米压印胶, 压印膜具(Stamp胶)等等 多元化光刻胶。
6.) 日本NANO SYSTEM SOLUTIONS(NSS)DL-1000 无掩模激光直写设备虽然疫情有所影响,是次展览会尚算顺利成功,场内人流还是不少,厂商、客户留览过本司展位,对展出的产品、资料等也感兴趣、并进行查询互动交流。
Company News October 11, 2021 Read MoreRe: The 9th Micro Photoresist Information Exchange Conference (Sep-8 to 12-2019) , hold at Changchun Institute of optics, Fine Mechanics & Physics – Technology Exchange Centre , Litho Tech Japn Co. Ltd( LTJ) & GenISys & Micro Resist Technology (MRT) are pleased to sponsor & introduce the related photoresist products & software.
1. Mr. Taksatorn (GenISys specialist) introduce BEAMER, TRACER, LAB (Simulation Software) & ProSEM- SEM Metrology Software.
2. Litho Tech Japan (LTJ) invited Mr. Taksatorn (GenISys specialist) share the information of Quality Control of Photoresist – Specification & Evaluation Method.
3. Mr. Raymond Lee (RNC TECHNOLOGY – Director) introduce Micro Resist Technology GmbH’s photoresist products & Nanoimprint resist products.
Company News September 08, 2019 Read MoreIC China 2019 has been held from Sep-3 to 5-2019 at the Shanghai New International Expo Centre.
RNCT has joined this exhibition on booth no. N4-168. We are proud to exhibit:
Micro Resist Technology GmbH (MRT)’s high quality Positive & Negative Photoresist,E-Beam photoresist、Lift-off resist、Greyscale & Direct Write Laser(DWL) resist.
DisChem (USA) – innovative chemical solutions for opto-electronic manufacturing, SurPass – Microlithoography Adhesion Promoter/Priming Agent & DisCharge – E-Beam / SEM Anti-Charging Agent.
GenISys GmbH – LAB (Optical Lithography Simulation Software), after getting the data from RDA, then use LAB to simulate the photoresist image. The results are almost the same as the real experiment image. It is time & money save for using LAB. ProSEM (Metrology Software) – SEM Image Analysis & Metrology.
Company News September 03, 2019 Read MoreSemicon China 2019 has been held from Mar-20 to 22-2019 at the Shanghai New International Expo Centre.
RNCT has joined this exhibition on booth no.T2242. We are proud to exhibit: Micro Resist Technology GmbH (MRT)’s high quality Positive & Negative Photoresist,E-Beam photoresist、Lift-off resist、Greyscale & Direct Write Laser(DWL) resist.DisChem (USA) – innovative chemical solutions for opto-electronic manufacturing, SurPass – Microlithoography Adhesion Promoter/Priming Agent & DisCharge – E-Beam / SEM Anti-Charging Agent.
GenISys GmbH – LAB (Optical Lithography Simulation Software), after getting the data from RDA, then use LAB to simulate the photoresist image. The results are almost the same as the real experiment image. It is time & money save for using LAB. ProSEM (Metrology Software) – SEM Image Analysis & Metrology.
Company News April 15, 2019 Read MoreRNCT & GenISys GmbH joined the ICDT 2019 Conference held from Mar 26 to 29 2019 in Kunshan, Suzhou, China at Kunshan International Convention & Exhibition Centre.
GenISys GmbH:
LAB (Optical Lithography Simulation Software) - after getting the data from RDA, then use LAB to simulate the photoresist image. The results are almost the same as the real experiment image. It is time & money save for using LAB.
ProSEM (Metrology Software) – SEM Image Analysis & Metrology:
Precise, Consistent Reliable Test Results & No Human Error & Subjective Judgement.
Company News March 26, 2019 Read More
RNCT Tech is honour to be the exclusive agent of DisChem - CHEMISTRY FOR ADVANCED LITHOGRAPHY PRODUCTS in China & HKSAR of:
(1). Microlithography Adhesion Promoter: SurPass 3000 & 4000.
(2). E-Beam/SEM Anti-charging Agent:
Re: The 8th Micro Photoresist Information Exchange Conference (Oct-9 to 12-2018 , hold at
Shanghai Jiao Tong University) & Shanghai ICRD visit RNC TECHNOLOGY , Litho Tech Japn Co. Ltd( LTJ) & GenISys are pleased to introduce the
related photoresist products & software.
(1). Mr. Taksatorn (GenISys specialist) introduce BEAMER, TRACER, LAB & ProSEM software.
(2). Mr. Minami (LTJ – PRESIDENT) share the exposure & development analyst report for BM photoresist.
(3). Mr. Raymond Lee (RNC TECHNOLOGY – Director) introduce Microresist Technology GmbH’s photoresist products & Nanoimprint resist products.
(4). Mr. Minami (LTJ) joined with Mr. Raymond Lee ( RNC Tech- Director ) & sales manager to visit Shanghai IC R&D Centre (ICRD) for LTJ photoresit analysis equipments & GenISys Gmbh related software.
Company News November 02, 2018 Read More
全球最大最具影響力的半導體中國 Semicon China 2018 展覽會,暨平板顯示器 FPD China 和慕尼黑上海電子展 Electronica
China。
3月14日至16日雲集上海蒲東新國際博覽中心, 我司高層和日本LTJ的CEO 與及德國 GenISys GmbH 的技術專家一起出席和參展客戶群等, 進行拜訪技術性支持交流活動,過程非常愉快和諧互動。
Company News April 23, 2018 Read More本司刚干4月10-12目参加了在中国广州箩岗会议中心举行的 ICDT2018 国际显示技朮会议。
ICDT2018 贵宾VIP晚宴,和同桌的日本千叶大学 Professor Ph.D. Mr. N. Kobayashi san 小林范久 教授,
东海大学 Professor Dr. M. Omodani san 面谷信教授等工学博士的合照。
We took part in the CHInano Conference & Expo in Suzhou International Expo Center, China on October 28 -30, 2015.
The major products we introduced included the Nanoimprint technology of the MUR series from Chemiway (Maruzen Petrochemical Co. Ltd.), the UV Resist Resin with high etching resistance(抗蚀性) and rapid hardening nature (迅速硬化性) and the function of Litho Tech Japan (LTJ) Photolithography and Photoresist Development Analysis Instrument.
The Conference is the largest-scaled and most influential occasion for nanotechnology development and exchange in China. It is also the best platform for corporates’ brand building, product promotion, technology matchmaking and market expansion.
CHInano attracted more than 5000 professional visitors, 8 nanotech cluster associations, 25 professional institutions from different countries and regions in the world, as well as over 500 enterprise exhibitors. In addition, the conference received over 100 professional reports and shared the latest achievements and cutting-edge information in the fields of micro nano manufacturing, nanobiological medicine, nano environmental protection and cleaning technology and new nanomaterials.
Meanwhile, the Nanotech Forum invited world renowned experts from the nanotech industry, research communities and government departments to share the latest application results, forward-looking researches and the nanotech strategies adopted by the governments.
Company News October 28, 2015 Read MoreChina's IC industry in the design, manufacturing, rapid growth in the first half of 2015, driven by rapid growth, according to the China Semiconductor Industry Association statistics, in the first half of 2015 China's IC industry sales of 159.16 billion yuan, an increase of 18.9%. Among them, the design industry sales of 55.02 billion yuan, an increase of 28.5%; manufacturing sales of 39.59 billion yuan, up 21.4 percent; packaging and testing industry sales of 64.55 billion yuan, an increase of 10.5%.
According to customs statistics, in the first half of 2015 imports of integrated circuits 143.98 billion, an increase of 10.5%; imports amounted to 103.71 billion US dollars, an increase of 4.9%. IC exports 82.31 billion, an increase of 20.9%; export value of $ 29.4 billion, an increase of 5.2%.
According to WTO statistics (WSTS), (15Q2) global semiconductor sales in the second quarter 2015 market value of $ 84 billion, from the previous quarter (15Q1) growth of 1.0% over last year (14Q2) growth of 2.0 percent; sales amounted to 1,995 billion, compared with the previous quarter (15Q1) growth of 4.1% over last year (14Q2) growth of 3.8%; ASP was $ 0.421, compared with the previous quarter (15Q1) decline of 3.0% over last year (14Q2) decline of 1.8%.
15Q2 US semiconductor market value of $ 16.6 billion, compared with the previous quarter (15Q1) decline of 4.7% over last year (14Q2) growth of 5.6 percent; the Japanese semiconductor market value of $ 7.7 billion, compared with the previous quarter (15Q1) growth of 0.8% over last year (14Q2) decline of 13.6%; the European semiconductor market sales value of $ 8.5 billion, compared with the previous quarter (15Q1) decline of 4.4% over last year (14Q2) decline of 11.5%; Asian semiconductor market value of 51.2 billion dollar, compared with the previous quarter (15Q1) growth of 4.1% over last year (14Q2) growth of 6.4%. Among them, the Chinese mainland market $ 24.4 billion, compared with the previous quarter (15Q1) growth of 3.8% over last year (14Q2) growth of 7.8%.
This year our company joined the 3rd International Printing Technology Exhibition of China (Guangdong) in HouJie, Dongguan. As the China and Hong Kong agent of several world renowned brands, our company always join in the big shows in China to promote our products. In this printing show, we are mainly to promote our famous Japan SAKURAI fully automatic cylinder screen printing machines.
During the show, our nucleus is to show the most advanced Sakurai printing machine Model MS80SD. Its accuracy is literally eye opening. It is specially designed for the strictest demands. Its registration accuracy is ±0.03mm. It incorporates high speed automatic printing and utmost accurate registration at the same time. Another bright spot of the show is the Sakurai newly introduced roll-to-roll screen printing machine MSDR60. This is the response to the industry’s severe demand for speedy and at the same time accurate screen printing on thin material in roll form.
The show is from April 7 to 12 for 6 days. All the traditional major brands of the European printing machines are here. It has a total of 9 halls. Each has its own theme of display. The visitors will not miss finding what they want by following the map.
This is a show of an immense scale. Our booth is in the main hall, Hall No.3. All the traditional major brands are here: Heidelberg, KBA, Komori, Man Roland are all here. We can see the visitors are incessant, especially in the first 3 or 4 days. So, Sakurai, the brand we represent, also has a big exposure. The Sakurai sales manager is also here to show their support. So, the exhibition is a big success!
The 3-day Semicon China 2015 Exhibition was held at Shanghai New International Expo Centre on March 17 -19, 2015.
Our company was one of the exhibitors, locating at Booth No. 5235 at Hall W5. There were 5 halls housing over 1000 booths for this large-scaled exhibition. Since its debut in Shanghai in 1988, Semicon China has become one of the most important occasions for semi-conductor industry, exhibiting the major worldwide manufacturers of semi-conductor facilities and materials. Semicon China has witnessed the growth of semi-conductor industry in China, and will undoubtedly contribute to this flourishing industry in the future.
CHInano 2014 took place at Hall 6B, Suzhou International Expo Centre on Sep 24 – 26, 2014. Our M07 & M08 exhibition booth sized 18 square meters.
We exhibited the latest nanoimprint machine imported from Japan and had a corporate roadshow on Sep 24 afternoon to introduce the most updated UV nanoimprint machine, which helps lower the cost of manufacturing FPD, Touch Panel, LED lighting, biotech, solar cell and display.